Veeco Introduces GENxplor Molecular Beam Epitaxy System
Industry's First Fully-Integrated MBE System for the Compound Semiconductor R&D Market
PLAINVIEW, N.Y.--(BUSINESS WIRE)-- Veeco Instruments Inc. (NAS: VECO) today introduced the GENxplor™ Molecular Beam Epitaxy (MBE) Deposition System, the industry's first fully-integrated MBE system for the compound semiconductor R&D market. The GENxplor creates high quality epitaxial layers on substrates up to 3" in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides.
Veeco's New GENxplor R&D MBE System (Photo: Business Wire)
"The compound semiconductor R&D community asked for a more affordable, flexible, and easy-to-use MBE system and Veeco has delivered with the GENxplor," commented Jim Northup, Veeco's Vice President and General Manager. "We have repackaged Veeco's industry-leading MBE technology into a novel 'all-in-one' design that combines the reactor and electronics on a single frame. It will change the way researchers use MBE."
The GENxplor uses Veeco's proven GEN10™ growth chamber design and features unmatched process flexibility, ideal for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells, and high-temperature superconductors. Its efficient single frame design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems. When coupled with Veeco's recently introduced retractable sources, the GENxplor system represents the state-of-the-art in oxide materials research.
In recognition of the growing influence and importance of China in the field of MBE research, Veeco is launching the GENxplor at this week's China MBE Conference in Shanghai. For more information on the GENxplor, please visit us at the China MBE Conference or go to www.veeco.com/genxplor.
Veeco's process equipment solutions enable the manufacture of LEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in MOCVD, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2011 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
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Veeco Instruments Inc.
Debra Wasser, 516-677-0200 x1472
SVP Investor Relations & Corporate Communications
Fran Brennen, 516-677-0200 x1222
Senior Director Marcom
KEYWORDS: United States Asia Pacific North America China New York
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