Swiss R&D Facility École Polytechnique Fédérale de Lausanne Orders Veeco Ion Beam Etch System
PLAINVIEW, N.Y.--(BUSINESS WIRE)-- Veeco Instruments Inc. (NAS: VECO) announced today that École Polytechnique Fédérale de Lausanne (EPFL), one of Europe's top technical universities, has ordered a NEXUS® Ion Beam Etch (IBE) System. The system will be used for state-of-the-art research and development projects in micro- and nano-fabrication at its Lausanne, Switzerland site. Veeco's IBE systems are used to etch precise, complex features for high-yield production of discrete microelectronic devices and components.
Dr. Philippe Flückiger, EPFL's Director of Operations commented, "Veeco has been well known as the top supplier of IBE technology for decades, so it was the clear choice for us. Ion Beam Etch is important in our micro- and nano-fabrication because we need the ability to accurately etch difficult to etch materials and multi-layer stacks used in today's emerging applications. Veeco's technology also provides us a level of precision in defining our structures not available with other dry etching techniques."
Vivek Vohra, Veeco's Vice President and General Manager, commented, "Given the growing trend of thin film based sensors being used in various consumer applications, we are very excited that our IBE technology has been selected by a new customer - EPFL - which is a top European research institution. We look forward to supporting their innovative research and industry collaborations." Veeco's IBE and other technologies are used globally by leading customers for etching/depositing various thin films to produce micro electro mechanical systems (MEMS) and magnetic sensors.
EPFL is Europe's most cosmopolitan technical university, receiving students, professors and staff from over 120 nationalities. EPFL's activities support partnerships, industry liaisons, start-ups and technology transfer. More information on EPFL can be found on their website at http://www.epfl.ch.
Veeco's process equipment solutions enable the manufacture of LEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in MOCVD, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2011 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press release. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
Debra Wasser, 516-677-0200 x1472
SVP Investor Relations & Corporate Communications
Fran Brennen, 516-677-0200 x1222
Senior Director Marcom
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The article Swiss R&D Facility École Polytechnique Fédérale de Lausanne Orders Veeco Ion Beam Etch System originally appeared on Fool.com.
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